top of page

PSI Cleanroom Laboratories

ma8_pico.jpg.webp
heidelberg_dwl66_pico.jpg.webp
nanoscribe_pico.jpg.webp

Lithography

  • SUSS MA8-BA6
    :: 200mm Mask Aligner
      :: Photolithography

  • SUSS MA6-BA6
    :: 150mm Mask Aligner
      :: Photolithography

  • Phable R200
    :: Displacement Talbot Lithography
    :: Photolithography

  • Heidelberg DWL66+
    :: 200mm Direct Laser Writer
    :: Maskless Lithography

  • Raith/Vistec EBPG 5000Plus
    :: Electron Beam Direct Writer
      :: Maskless Lithography

  • Nanoscribe GT+
    :: Two-photon Direct Writer
      :: Maskless Lithography

r5_wetetching.jpeg.webp
Oxford_DRIE_PICO.jpg.webp
oxford_ionfab_pico.jpg.webp

Etching & Developing

  • Wet Chemistry Area
    :: Etching with acids and alkali
    :: Sample Processing

  • Photolithography Area
    :: Exposures Development 
    :: Sample Processing

  • Oxford DRIE
    :: PlasmaLab 100 ICP Deep Reactive Ion Etcher
       :: Plasma Etching
         :: 100mm

  • Sentech ICP RIE
    :: SI500 ICP Reactive Ion Etcher
      :: Plasma Etching
           :: 200mm

  • SPTS DRIE
    :: Rapier Omega LPX Deep Reactive Ion Etcher
      :: Plasma Technology
          :: 200mm

  • Oxford IonFab 300Plus
    :: Ar Ion Milling / Ion Beam Deposition (IBD) Tool
      :: Plasma Technology
           :: 100mm

  • Oxford ICP RIE
    :: PlasmaLab 100 Inductively Coupled Plasma Reactive Ion Etcher (ICP-RIE)
      :: Plasma Technology
           :: 100mm​

evatec_evaporator.jpg.webp
ald_picosun_r6_front_edited_edited.jpg
sdc18926.jpg.webp

Thin Films Deposition

  • Evatec BAKUNI
    :: Physical Vapor Deposition
      :: Thin Film Technology
           :: 200mm​

  • Oxford PECVD
    ::  PlasmaLab 80+ Plasma Enchanced Chemical Vapor Deposition
      :: Thin Film Technology
           :: 100mm

  • Picosun PE-ALD
    :: R200 Plasma Enhanced Atomic Layer Deposition (PE-ALD)
      :: Thin Film Technology
           :: 200mm

  • STEED 
      :: Oxidation Furnace
        :: Thin Film Technology

  • Leibold UNIVEX
      :: Physical Vapor Deposition (e-gun evaporator)
        :: Thin Film Technology

lmn_sem_zeiss_vp55.jpg.webp
keyence_confocalmicroscope_r3_edited.jpg

Sample Inspection

  • Zeiss Supra 55VP
    :: Scanning Electron Microscope (Variable Pressure mode)
     :: Sample Inspection

  • Hitachi Regulus 8230
    :: Scanning Electron Microscope with EDX
     :: Sample Inspection

  • Leica DM800M
    :: Digital Light Microscope 
     :: Sample Inspection

  • Veeco DEKTAK 8
    :: Stylus Profilometer
     :: Sample Inspection

  • KEYENCE VK-X3100
    :: 3D Optical Profiler
      :: Sample Inspection

Tool reservation in PICO

​All the tools available in PICO can be reserved using Openiris. 
You can find all the tools by searching for "cleanroom" in the "Enter filter texts" top left window, or for the tool name listed on this webpage.

Contact

Group Leader "Nanotechnology"

Dr. Vitaliy Guzenko

EPIA/A1.O2.00

E-Mail: vitaliy.guzenko@psi.ch

T: +41 56 310 54 36

​

EBL:​

​

Dr. Kevin Anthony Hofhuis
EPIA/A1.O2.00

E-Mail: kevin.hofhuis@psi.ch

T: +41 56 310 39 74
 

 

SEMs:


Dr Mihai-Silviu Gabureac

EPIA/A1.O2.00

E-Mail: mihai.gabureac@psi.ch

T: +41 56 310 38 42

​

© 2025 microscopy-nwch.com

bottom of page